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dc.contributor.authorYu, Shu-Hungen_US
dc.contributor.authorLin, Weien_US
dc.contributor.authorChen, Yu-Hungen_US
dc.contributor.authorChang, Chun-Yenen_US
dc.date.accessioned2014-12-08T15:23:23Z-
dc.date.available2014-12-08T15:23:23Z-
dc.date.issued2012en_US
dc.identifier.issn1110-662Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/16375-
dc.identifier.urihttp://dx.doi.org/817825en_US
dc.description.abstractThe improved performance for hydrogenated microcrystalline silicon-germanium (mu c-Si1-xGex:H, x similar to 0.1) p-i-n single solar cells with hydrogenated microcrystalline silicon (mu c-Si:H) field-enhancement layers (FELs) is demonstrated for the first time. The fill factor (FF) and conversion efficiency (eta) increase by about 19% and 28% when the thickness of the mu c-Si FEL is increased from 0 to 200 nm, it is attributed to the longer hole life-time and enhanced electric field in the mu c-Si0.9Ge0.1:H layer. Therefore, we can successfully manufacture high-performance mu c-SiGe:H solar cells with the thickness of absorbers smaller than 1 mu m by conducting FELs. Moreover, the simulation tool is used to simulate the current-voltage (J-V) curve, thus we can investigate the carrier transport in the absorber of mu c-Si0.9Ge0.1:H solar cells with different EFLs.en_US
dc.language.isoen_USen_US
dc.titleHigh Improvement in Conversion Efficiency of mu c-SiGe Thin-Film Solar Cells with Field-Enhancement Layersen_US
dc.typeArticleen_US
dc.identifier.doi817825en_US
dc.identifier.journalINTERNATIONAL JOURNAL OF PHOTOENERGYen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000305008900001-
dc.citation.woscount0-
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