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dc.contributor.authorRaghunath, P.en_US
dc.contributor.authorLin, M. C.en_US
dc.date.accessioned2014-12-08T15:23:54Z-
dc.date.available2014-12-08T15:23:54Z-
dc.date.issued1970-01-01en_US
dc.identifier.issn0021-9606en_US
dc.identifier.urihttp://dx.doi.org/14315en_US
dc.identifier.urihttp://hdl.handle.net/11536/16631-
dc.description.abstract"The kinetics and mechanism for the reaction of ClOO with NO have been investigated by ab initio molecular orbital theory calculations based on the CCSD(T)/6-311+G(3df)//PW91PW91/6-311+G(3df) method, employed to evaluate the energetics for the construction of potential energy surfaces and prediction of reaction rate constants. The results show that the reaction can produce two key low energy products ClNO + O-3(2) via the direct triplet abstraction path and ClO + NO2 via the association and decomposition mechanism through long-lived singlet pc-ClOONO and ClONO2 intermediates. The yield of ClNO + O-2 ((1)Delta) from any of the singlet intermediates was found to be negligible because of their high barriers and tight transition states. As both key reactions initially occur barrierlessly, their rate constants were evaluated with a canonical variational approach in our transition state theory and Rice-Ramspergen-Kassel-Marcus/master equation calculations. The rate constants for ClNO + O-3(2) and ClO + NO2 production from ClOO + NO can be given by 2.66 x 10(-16) T-1.91 exp(341/T) (200-700 K) and 1.48 x 10(-24) T-3.99 exp(1711/T) (200-600 K), respectively, independent of pressure below atmospheric pressure. The predicted total rate constant and the yields of ClNO and NO2 in the temperature range of 200-700 K at 10-760 Torr pressure are in close agreement with available experimental results. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4731883]"en_US
dc.language.isoen_USen_US
dc.titleAb initio chemical kinetics for the ClOO+NO reaction: Effects of temperature and pressure on product branching formationen_US
dc.typeArticleen_US
dc.identifier.doi14315en_US
dc.identifier.journalJOURNAL OF CHEMICAL PHYSICSen_US
dc.citation.volume137en_US
dc.citation.issue1en_US
dc.citation.epageen_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000306142600028-
dc.citation.woscount1-
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