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dc.contributor.authorTsai, Mei-Huien_US
dc.contributor.authorHuang, Yi-Chiaen_US
dc.contributor.authorTseng, I-Hsiangen_US
dc.contributor.authorYu, Hsin-Peien_US
dc.contributor.authorLin, Yin-Kaien_US
dc.date.accessioned2014-12-08T15:24:07Z-
dc.date.available2014-12-08T15:24:07Z-
dc.date.issued2012-11-25en_US
dc.identifier.issn0021-8995en_US
dc.identifier.urihttp://dx.doi.org/10.1002/app.36615en_US
dc.identifier.urihttp://hdl.handle.net/11536/16787-
dc.description.abstractA facile method was developed to synthesize porous polyimide (PI) films with enhanced adhesion to Cu foil. Various amounts (0.14 wt %) of polystyrene (PS) spheres with the diameter of 250 nm were mixed with the PI precursor synthesized from pyromellitic dianhydride (PMDA) and 4,4'-oxydianiline in N,N'-dimethylacetamide. PS was decomposed during thermal imidization process to create the porous PI structure. The increase in surface area and surface roughness was observed from the obtained porous PI films and was a function of the PS content up to 4 wt %. A significant improvement in the adhesion strength between porous PI film and Cu foil, which was determined by 90 degrees peel test, was achieved. The adhesion strength of PI containing 4 wt % PS to Cu was 1.53 kgf/cm compared with pure PI of 1.08 kgf/cm. Meanwhile, the synthesized porous PI films exhibit sufficient mechanical strength and thermal stability for practical applications. (c) 2012 Wiley Periodicals, Inc. J Appl Polym Sci, 2012en_US
dc.language.isoen_USen_US
dc.subjectporous polyimideen_US
dc.subjectpolystyreneen_US
dc.subjectadhesionen_US
dc.titleEnhancement of adhesion between copper foil and polyimide film containing thermally decomposable polystyrene particlesen_US
dc.typeArticleen_US
dc.identifier.doi10.1002/app.36615en_US
dc.identifier.journalJOURNAL OF APPLIED POLYMER SCIENCEen_US
dc.citation.volume126en_US
dc.citation.issueen_US
dc.citation.spageE365en_US
dc.citation.epageE370en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000307100200046-
dc.citation.woscount2-
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