標題: | Nanotribological behavior of thermal treatment of zinc titanate thin films |
作者: | Wu, Shyh-Chi Yau, Wei-Hung Tsai, Chien-Huang Chou, Chang-Pin 機械工程學系 Department of Mechanical Engineering |
關鍵字: | radio frequency magnetron co-sputtering;friction;atomic force microscopy;X-ray photoelectron spectroscopy |
公開日期: | 1-十月-2012 |
摘要: | We present a study of the nanotribological behavior of ZnTiO3 films; the surface morphology, stoichiometry, and friction (mu) were analyzed using atomic force microscopy, X-ray photoelectron spectroscopy, and nanoscratch system. It is confirmed that the measured values of H and mu of the ZnTiO3 films were in the range from 8.5?+/-?0.4 to 5.6?+/-?0.4 GPa and from 0.164 to 0.226, respectively. It is suggested that the hexagonal ZnTiO3 decomposes into cubic Zn2TiO4 and rutile TiO2 based on the thermal treatment; the H, mu, and RMS were changed owing to the grain growth and recovery that results in a relax crystallinity of ZnTiO3 films. From X-ray photoelectron spectroscopy measured, core levels of O 1 can attribute the weaker bonds as well as lower resistance after thermal treatment. The XRD patterns showed that as-deposited films are mainly amorphous; however, the hexagonal ZnTiO3 phase was observed with the ZnTiO3 (104), (110), (116), and (214) peaks from 620 to 820 degrees C, indicating that there is highly (104)-oriented ZnTiO3 on the silicon substrate. Copyright (c) 2012 John Wiley & Sons, Ltd. |
URI: | http://dx.doi.org/10.1002/sia.5019 http://hdl.handle.net/11536/16834 |
ISSN: | 0142-2421 |
DOI: | 10.1002/sia.5019 |
期刊: | SURFACE AND INTERFACE ANALYSIS |
Volume: | 44 |
Issue: | 10 |
起始頁: | 1314 |
結束頁: | 1318 |
顯示於類別: | 期刊論文 |