完整後設資料紀錄
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dc.contributor.authorYou, Hsin-Chiangen_US
dc.contributor.authorChang, Chun-Mingen_US
dc.contributor.authorLiu, Tzeng-Fengen_US
dc.contributor.authorCheng, Chih-Chiaen_US
dc.contributor.authorChang, Feng-Chihen_US
dc.contributor.authorKo, Fu-Hsiangen_US
dc.date.accessioned2014-12-08T15:24:14Z-
dc.date.available2014-12-08T15:24:14Z-
dc.date.issued2012-10-01en_US
dc.identifier.issn0169-4332en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.apsusc.2012.06.079en_US
dc.identifier.urihttp://hdl.handle.net/11536/16838-
dc.description.abstractThis study successfully prepared zirconia ultrathin films from the sol-gel solution with dispersion of zirconium halide in 1-octanol solvent. The film was subjected to annealing treatments after sol-gel spin-coating, and the films of interest were evaluated. The amorphous morphology of the zirconia film was identified using high-resolution transmission electron microscopy and X-ray diffractometry. The plot of the current density with respect to the electric field demonstrates that the as-deposited film at 500 degrees C annealing exhibited an inferior leakage current, whereas 600 degrees C annealing stabilized the film with a satisfactory leakage current of 10(-8) to 10(-9) A/cm(2). The out-gassing behavior of the sol-gel-derived thin film was evaluated using a thermal desorption system, that is, atmospheric pressure ionization mass spectrometry. The dielectric constant of the film was dependent on the retention effect of the preparation solvents. The low residual solvent for the preparation of the thin film with 1-octanol solvent and 600 degrees C annealing contributed to the superior high-k property. (C) 2012 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectZirconia ultrathin filmen_US
dc.subjectSol-gelen_US
dc.subjectHigh dielectric materialen_US
dc.subjectOut-gassing contaminationen_US
dc.titleFacile preparation of sol-gel-derived ultrathin and high-dielectric zirconia films for capacitor devicesen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.apsusc.2012.06.079en_US
dc.identifier.journalAPPLIED SURFACE SCIENCEen_US
dc.citation.volume258en_US
dc.citation.issue24en_US
dc.citation.spage10084en_US
dc.citation.epage10088en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000307729600092-
dc.citation.woscount1-
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