完整後設資料紀錄
DC 欄位語言
dc.contributor.authorHu, Shao-Yuen_US
dc.contributor.authorLee, Wen-Hsien_US
dc.contributor.authorChang, Shih-Chiehen_US
dc.contributor.authorWang, Ying-Langen_US
dc.date.accessioned2014-12-08T15:24:16Z-
dc.date.available2014-12-08T15:24:16Z-
dc.date.issued2012-09-01en_US
dc.identifier.issn1533-4880en_US
dc.identifier.urihttp://dx.doi.org/10.1166/jnn.2012.6164en_US
dc.identifier.urihttp://hdl.handle.net/11536/16867-
dc.description.abstractIn this study, copper indium diselenide (CIS) films were synthesized from electrodeposited Cu-Se In Se precursors by three step annealing. The Se layer between Cu and In layer was grown to prevent the formation of Cu/In compound. The Cu Se precursors were first annealed to grow uniform and conductive Cu2Se surface. After deposition of the four layers precursors, two steps annealing was employed to form Cu2Se-In2Se3 precursors. Transforming Cu2Se-In2Se3 to CIS required less thermal energy. Therefore, high quality CIS film can be synthesized by two steps annealing due to its high crystallinity. The properties of the CIS films were characterized by scanning electron microscopy (SEM), X-ray Diffraction (XRD), and Raman Spectra.en_US
dc.language.isoen_USen_US
dc.subjectCuInSe2en_US
dc.subjectCISen_US
dc.subjectAnnealingen_US
dc.subjectElectrodepositionen_US
dc.titleA Novel Synthesis of a CuInSe2 Thin Film from Electrodeposited Cu-Se-In-Se Precursors with Three Steps Annealingen_US
dc.typeArticleen_US
dc.identifier.doi10.1166/jnn.2012.6164en_US
dc.identifier.journalJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGYen_US
dc.citation.volume12en_US
dc.citation.issue9en_US
dc.citation.spage7226en_US
dc.citation.epage7232en_US
dc.contributor.department照明與能源光電研究所zh_TW
dc.contributor.departmentInstitute of Lighting and Energy Photonicsen_US
dc.identifier.wosnumberWOS:000308856200050-
dc.citation.woscount3-
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