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dc.contributor.authorPan, Hsu-Anen_US
dc.contributor.authorHung, Yao-Chingen_US
dc.contributor.authorChiou, Jin-Chernen_US
dc.contributor.authorTai, Shih-Mingen_US
dc.contributor.authorChen, Hsin-Hungen_US
dc.contributor.authorHuang, G. Stevenen_US
dc.date.accessioned2014-12-08T15:24:18Z-
dc.date.available2014-12-08T15:24:18Z-
dc.date.issued2012-08-24en_US
dc.identifier.issn0957-4484en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0957-4484/23/33/335703en_US
dc.identifier.urihttp://hdl.handle.net/11536/16900-
dc.description.abstractA strategy was proposed for the topological design of dental implants based on an in vitro survey of optimized nanodot structures. An in vitro survey was performed using nanodot arrays with dot diameters ranging from 10 to 200 nm. MG63 osteoblasts were seeded on nanodot arrays and cultured for 3 days. Cell number, percentage undergoing apoptotic-like cell death, cell adhesion and cytoskeletal organization were evaluated. Nanodots with a diameter of approximately 50 nm enhanced cell number by 44%, minimized apoptotic-like cell death to 2.7%, promoted a 30% increase in microfilament bundles and maximized cell adhesion with a 73% increase in focal adhesions. An enhancement of about 50% in mineralization was observed, determined by von Kossa staining and by Alizarin Red S staining. Therefore, we provide a complete range of nanosurfaces for growing osteoblasts to discriminate their nanoscale environment. Nanodot arrays present an opportunity to positively and negatively modulate cell behavior and maturation. Our results suggest a topological approach which is beneficial for the design of dental implants.en_US
dc.language.isoen_USen_US
dc.titleNanosurface design of dental implants for improved cell growth and functionen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0957-4484/23/33/335703en_US
dc.identifier.journalNANOTECHNOLOGYen_US
dc.citation.volume23en_US
dc.citation.issue33en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:000307251600015-
dc.citation.woscount1-
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