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dc.contributor.authorLin, Yu-Hsuanen_US
dc.contributor.authorTsai, Din Pingen_US
dc.date.accessioned2014-12-08T15:24:25Z-
dc.date.available2014-12-08T15:24:25Z-
dc.date.issued2012-07-16en_US
dc.identifier.issn1094-4087en_US
dc.identifier.urihttp://dx.doi.org/10.1364/OE.20.016205en_US
dc.identifier.urihttp://hdl.handle.net/11536/16936-
dc.description.abstractThis study presents a novel near-field optics technology. A near-field cover glass slip (NF-CGS) was developed to improve the resolution of optical microscopy beyond the diffraction limit. A multi-layered structure of cover glass/ZnS-SiO2 (130 nm)/AgOx (15 nm)/ ZnS-SiO2 (40 nm) was employed to generate the optical coupling effect for increasing the contrast and enhancing resolution of imaging. This novel innovation is expected to be employed in near-field imaging techniques for samples in different environments because of its simplicity, rapid laser scanning, and minimal costs. Experimental results of 500 nm, 200 nm, and 100 nm standard polystyrene nanospheres on NF-CGS and normal cover glass are demonstrated and imaged by using a laser scanning confocal microscope. (C) 2012 Optical Society of Americaen_US
dc.language.isoen_USen_US
dc.titleNear-field scanning optical microscopy using a super-resolution cover glass slipen_US
dc.typeArticleen_US
dc.identifier.doi10.1364/OE.20.016205en_US
dc.identifier.journalOPTICS EXPRESSen_US
dc.citation.volume20en_US
dc.citation.issue15en_US
dc.citation.spage16205en_US
dc.citation.epage16211en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000307055800008-
dc.citation.woscount3-
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