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dc.contributor.authorHONG, TMen_US
dc.contributor.authorCHEN, SHen_US
dc.contributor.authorCHIOU, YSen_US
dc.contributor.authorCHEN, CFen_US
dc.date.accessioned2014-12-08T15:03:08Z-
dc.date.available2014-12-08T15:03:08Z-
dc.date.issued1995-10-09en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.114749en_US
dc.identifier.urihttp://hdl.handle.net/11536/1701-
dc.description.abstractThe influence of nitrogen on the growth of diamond using the gas mixtures of CHS-CO, by microwave plasma chemical vapor deposition was investigated. A clear improvement in the surface morphology and quality of the diamond films indicates the beneficial effect of adding nitrogen to CH4-CO gas mixtures. Analysis using Auger electron spectroscopy and secondary ion mass spectroscopy shows very low and uniform levels of nitrogen in the diamond films. Atomic nitrogen plays a dominant role in C/H/O/N plasma chemical vapor deposition processes because of the amount of oxygen atoms increased via the titration reaction of nitrogen atoms (a high-rate reaction): N+NO-->N-2+O. This produces a significant influence on diamond synthesis in a CH4-CO2-N-2 gas mixture. (C) 1995 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleOPTICAL-EMISSION SPECTROSCOPY STUDIES OF THE EFFECTS OF NITROGEN ADDITION ON DIAMOND SYNTHESIS IN A CH4-CO2 GAS-MIXTUREen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.114749en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume67en_US
dc.citation.issue15en_US
dc.citation.spage2149en_US
dc.citation.epage2151en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:A1995RY39800014-
dc.citation.woscount17-
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