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dc.contributor.authorWang, H. Y.en_US
dc.contributor.authorChen, C. H.en_US
dc.contributor.authorNiu, H.en_US
dc.contributor.authorWu, S. C.en_US
dc.contributor.authorLee, C. P.en_US
dc.date.accessioned2014-12-08T15:24:43Z-
dc.date.available2014-12-08T15:24:43Z-
dc.date.issued2006en_US
dc.identifier.issn0272-9172en_US
dc.identifier.urihttp://hdl.handle.net/11536/17168-
dc.description.abstractThe strain status of the buried self-assembled InAs quantum dots was comprehended by measurement first time. Results show the in-plane strain is compressive and the lattice in the growth direction is lager than the lattice of GaAs. The strain of the sample annealed at 650 degrees C relaxes in the growth direction. The growth and the lateral direction become relaxed in the sample annealed at 750 degrees C.en_US
dc.language.isoen_USen_US
dc.titleThe strain status of the buried self-assembled InAs quantum dots using MeV techniqueen_US
dc.typeProceedings Paperen_US
dc.identifier.journalSolid-State Lighting Materials and Devicesen_US
dc.citation.volume916en_US
dc.citation.spage29en_US
dc.citation.epage34en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:000245337000004-
顯示於類別:會議論文