完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chang, Chia-Yuan | en_US |
dc.contributor.author | Chang, Edward Yi | en_US |
dc.contributor.author | Lien, Yi-Chung | en_US |
dc.contributor.author | Miyamoto, Yasuyuki | en_US |
dc.contributor.author | Chen, Szu-Hung | en_US |
dc.contributor.author | Chu, Li-Hsin | en_US |
dc.date.accessioned | 2014-12-08T15:24:46Z | - |
dc.date.available | 2014-12-08T15:24:46Z | - |
dc.date.issued | 2006 | en_US |
dc.identifier.isbn | 978-0-7803-9730-9 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/17216 | - |
dc.identifier.uri | http://dx.doi.org/10.1109/SMELEC.2006.381095 | en_US |
dc.description.abstract | A 70-nm In0.52Al0.48As/In0.6Ga0.4As power MHEMT with double delta-doping was fabricated and evaluated. The device has a high transconductance of 827 mS/mm. The saturated drain-source current of the device is 890 mA/mm. A current gain cutoff frequency (f(T)) of 200 GHz and a maximum oscillation frequency of 300 GHz were achieved due to the nanometer gate length and the high Indium content in the channel. When measured at 32 GHz, the 4 x 40 mu m device demonstrates a maximum output power of 14.5 dBm with P1dB of 11.1 dBm and the power gain is 9.5 dB. The excellent DC and RF performance of the 70-nm MHEMT shows a great potential for Ka-band power applications. | en_US |
dc.language.iso | en_US | en_US |
dc.title | High-performance In0.52Al0.48As/In(0.6)Ga(0.)4As power metamorphic HEMT for Ka-band applications | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.doi | 10.1109/SMELEC.2006.381095 | en_US |
dc.identifier.journal | 2006 IEEE International Conference on Semiconductor Electronics, Proceedings | en_US |
dc.citation.spage | 422 | en_US |
dc.citation.epage | 424 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000247966500091 | - |
顯示於類別: | 會議論文 |