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dc.contributor.authorPan, CLen_US
dc.date.accessioned2014-12-08T15:25:17Z-
dc.date.available2014-12-08T15:25:17Z-
dc.date.issued2005en_US
dc.identifier.isbn0-8194-5699-3en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/17660-
dc.identifier.urihttp://dx.doi.org/10.1117/12.596668en_US
dc.description.abstractThe photoconductive (PC) antenna fabricated on arsenic-ion-implanted GaAs (GaAs:As+) and proton-bombarded InP (InP:H+) substrates are shown to have a useful detection bandwidths beyond 30 THz. This is comparable to that of the reference LT-GaAs PC antenna. The signal-to-noise ratio of these ion-implanted III-V PC antennas are, however, worse than that of the LT-GaAs devices because of the higher stray currents of the former under illumination. Ion-implanted III-V PC antennas are nevertheless attractive because the implanters are widely available, process parameters well-established and compatible with the IC industry. Implantations in selective areas are also straight forward. Our results suggest that ion-implanted III-V material can be a good choice as substrate or THz PC antennas, if the resistivity is increased by a proper annealing process and/or optimizing the implantation recipe.en_US
dc.language.isoen_USen_US
dc.subjectTHz radiationen_US
dc.subjectdetectionen_US
dc.subjectarsenic-ion-implanted GaAsen_US
dc.subjectproton-bombarded InPen_US
dc.subjectIII-Ven_US
dc.subjectphotoconductive antennaen_US
dc.titleUltra-broadband THz field detection by ion-implanted III-VPC antennaen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1117/12.596668en_US
dc.identifier.journalUltrafast Phenomena in Semiconductors and Nanostructure Materials IXen_US
dc.citation.volume5725en_US
dc.citation.spage53en_US
dc.citation.epage60en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000229338500006-
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