完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chiu, Po-Yen | en_US |
dc.contributor.author | Ker, Ming-Dou | en_US |
dc.contributor.author | Tsai, Fu-Yi | en_US |
dc.contributor.author | Chang, Yeong-Jar | en_US |
dc.date.accessioned | 2014-12-08T15:25:20Z | - |
dc.date.available | 2014-12-08T15:25:20Z | - |
dc.date.issued | 2009 | en_US |
dc.identifier.isbn | 978-1-4244-2888-5 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/17724 | - |
dc.description.abstract | A new power-rail ESD clamp circuit with ultra-low-leakage design is presented and verified in a 65-nm CMOS process with a leakage current of only 116nA at 25 degrees C, which is much smaller than that (613 mu A) of traditional design. Moreover, it can achieve ESD robustness of over 8kV in HBM and 800V in MM ESD tests, respectively. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | electrostatic discharge (ESD) | en_US |
dc.subject | ESD clamp circuit | en_US |
dc.subject | gate leakage | en_US |
dc.subject | silicon-controlled rectifier (SCR) | en_US |
dc.title | Ultra-Low-Leakage Power-Rail ESD Clamp Circuit in Nanoscale Low-Voltage CMOS Process | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.journal | 2009 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM, VOLS 1 AND 2 | en_US |
dc.citation.spage | 750 | en_US |
dc.citation.epage | 753 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000272068100123 | - |
顯示於類別: | 會議論文 |