完整後設資料紀錄
DC 欄位語言
dc.contributor.authorChiu, Po-Yenen_US
dc.contributor.authorKer, Ming-Douen_US
dc.contributor.authorTsai, Fu-Yien_US
dc.contributor.authorChang, Yeong-Jaren_US
dc.date.accessioned2014-12-08T15:25:20Z-
dc.date.available2014-12-08T15:25:20Z-
dc.date.issued2009en_US
dc.identifier.isbn978-1-4244-2888-5en_US
dc.identifier.urihttp://hdl.handle.net/11536/17724-
dc.description.abstractA new power-rail ESD clamp circuit with ultra-low-leakage design is presented and verified in a 65-nm CMOS process with a leakage current of only 116nA at 25 degrees C, which is much smaller than that (613 mu A) of traditional design. Moreover, it can achieve ESD robustness of over 8kV in HBM and 800V in MM ESD tests, respectively.en_US
dc.language.isoen_USen_US
dc.subjectelectrostatic discharge (ESD)en_US
dc.subjectESD clamp circuiten_US
dc.subjectgate leakageen_US
dc.subjectsilicon-controlled rectifier (SCR)en_US
dc.titleUltra-Low-Leakage Power-Rail ESD Clamp Circuit in Nanoscale Low-Voltage CMOS Processen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2009 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM, VOLS 1 AND 2en_US
dc.citation.spage750en_US
dc.citation.epage753en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000272068100123-
顯示於類別:會議論文