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dc.contributor.authorHuang, SYen_US
dc.contributor.authorChen, KMen_US
dc.contributor.authorHuang, GWen_US
dc.contributor.authorYang, DYen_US
dc.contributor.authorChang, CYen_US
dc.contributor.authorLiang, Ven_US
dc.contributor.authorTseng, HCen_US
dc.date.accessioned2014-12-08T15:25:25Z-
dc.date.available2014-12-08T15:25:25Z-
dc.date.issued2005en_US
dc.identifier.isbn0-7803-8845-3en_US
dc.identifier.issn0149-645Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/17805-
dc.description.abstractThis paper investigates hot-carrier (HQ effects on the RF power and linearity characteristics of MOS transistors using load-pull measurement. We found that the RF power characteristics are affected by the HC stress, and the linearity of MOS transistors is clearly degraded after HC stress at constant gate voltage measurement. However, at high gate voltage bias, the HC-induced power degradation is much reduced compared with that under low gate voltage regimes. In addition, HC effects on linearity can be softened by biasing the transistor at constant drain currents. These experimental observations can be explained by the change of threshold voltage, transconductance, subthreshold swing, and mobility degradation coefficient under HC stress.en_US
dc.language.isoen_USen_US
dc.subjecthot-carrier stressen_US
dc.subjectload-pull measurementen_US
dc.subjectpoweren_US
dc.subjectlinearityen_US
dc.titleImpact of hot carrier stress on RF power characteristics of MOSFETsen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2005 IEEE MTT-S International Microwave Symposium, Vols 1-4en_US
dc.citation.spage161en_US
dc.citation.epage164en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000234561200037-
Appears in Collections:Conferences Paper