完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Kao, HL | en_US |
dc.contributor.author | Chin, A | en_US |
dc.contributor.author | Huang, CC | en_US |
dc.contributor.author | Hung, BF | en_US |
dc.contributor.author | Chiang, KC | en_US |
dc.contributor.author | Lai, ZM | en_US |
dc.contributor.author | McAlister, SP | en_US |
dc.contributor.author | Chi, CC | en_US |
dc.date.accessioned | 2014-12-08T15:25:25Z | - |
dc.date.available | 2014-12-08T15:25:25Z | - |
dc.date.issued | 2005 | en_US |
dc.identifier.isbn | 0-7803-8845-3 | en_US |
dc.identifier.issn | 0149-645X | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/17808 | - |
dc.identifier.uri | http://dx.doi.org/10.1109/MWSYM.2005.1516584 | en_US |
dc.description.abstract | A low minimum noise figure (NFmin) of 1.2 dB and high associated gain of 12.8 dB at 10 GHz, were measured for 0.18 mu m RF MOSFETs on plastic, made by substrate thinning (similar to 30 mu m), transfer and bonding. The performance can be further improved to 0.96 dB NFmin and 14.1 dB associated gain at 10 GHz, under applied tensile strain, using flexible Si on plastic. A 3.5 nH inductor on plastic showed a 55% higher Q-factor with a wider frequency range, compared with that on a Si substrate. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | RF noise | en_US |
dc.subject | associated gain | en_US |
dc.subject | MOSFET | en_US |
dc.subject | plastic | en_US |
dc.title | Low noise and high gain RF MOSFETs on plastic substrates | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.doi | 10.1109/MWSYM.2005.1516584 | en_US |
dc.identifier.journal | 2005 IEEE MTT-S International Microwave Symposium, Vols 1-4 | en_US |
dc.citation.spage | 295 | en_US |
dc.citation.epage | 298 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000234561200068 | - |
顯示於類別: | 會議論文 |