Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chang, Kow-Ming | en_US |
dc.contributor.author | Kuo, Jiun-Ming | en_US |
dc.contributor.author | Wu, Heng-Hsin | en_US |
dc.contributor.author | Tzeng, Wen-Hsien | en_US |
dc.contributor.author | Wu, Tzu-liu | en_US |
dc.contributor.author | Chao, Wen-Chan | en_US |
dc.date.accessioned | 2014-12-08T15:03:13Z | - |
dc.date.available | 2014-12-08T15:03:13Z | - |
dc.date.issued | 2008 | en_US |
dc.identifier.isbn | 978-1-4244-1572-4 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/1785 | - |
dc.description.abstract | Nanowire is mainly used in biological sensor because it has the high surface-to-volume ratio. In this study, we have successfully fabricated the Poly-Si and SiGe nanowire with Ge = 7% and 11 % respectively by side-wall spacer technique. In order to normalize the drive current of nanowires, we consider the nanowire as a resistance. The conductance Is chose for comparison between the nanowires. The higher conductance achieved of SlGe nanowire with/without nanowire implantation and the SlGe nanowire with higher Ge concentration had higher conductance. However, the disadvantage of lower contact resistance Is found in SiGe pad. The 3-amino-propyltriethoxy-silane (APTES) was used to modify the surface, which can detect the charge with different pH. Comparing the conductance change; the SiGe nanowire with higher Ge concentration improved the sensitivity. But the over-higher Ge concentration (40%) did not Increase the sensitivity; the reason maybe the higher defect appears at the surface as higher Ge concentration. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Higher Drive Current for SiGe Nanowires | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.journal | 2008 2ND IEEE INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1-3 | en_US |
dc.citation.spage | 315 | en_US |
dc.citation.epage | 319 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000259893500071 | - |
Appears in Collections: | Conferences Paper |