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dc.contributor.authorChang, Kow-Mingen_US
dc.contributor.authorKuo, Jiun-Mingen_US
dc.contributor.authorWu, Heng-Hsinen_US
dc.contributor.authorTzeng, Wen-Hsienen_US
dc.contributor.authorWu, Tzu-liuen_US
dc.contributor.authorChao, Wen-Chanen_US
dc.date.accessioned2014-12-08T15:03:13Z-
dc.date.available2014-12-08T15:03:13Z-
dc.date.issued2008en_US
dc.identifier.isbn978-1-4244-1572-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/1785-
dc.description.abstractNanowire is mainly used in biological sensor because it has the high surface-to-volume ratio. In this study, we have successfully fabricated the Poly-Si and SiGe nanowire with Ge = 7% and 11 % respectively by side-wall spacer technique. In order to normalize the drive current of nanowires, we consider the nanowire as a resistance. The conductance Is chose for comparison between the nanowires. The higher conductance achieved of SlGe nanowire with/without nanowire implantation and the SlGe nanowire with higher Ge concentration had higher conductance. However, the disadvantage of lower contact resistance Is found in SiGe pad. The 3-amino-propyltriethoxy-silane (APTES) was used to modify the surface, which can detect the charge with different pH. Comparing the conductance change; the SiGe nanowire with higher Ge concentration improved the sensitivity. But the over-higher Ge concentration (40%) did not Increase the sensitivity; the reason maybe the higher defect appears at the surface as higher Ge concentration.en_US
dc.language.isoen_USen_US
dc.titleHigher Drive Current for SiGe Nanowiresen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2008 2ND IEEE INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1-3en_US
dc.citation.spage315en_US
dc.citation.epage319en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000259893500071-
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