SYNTHESIS OF CARBON NITRIDE FILMS BY MAGNETICALLY ROTATED ARC-PLASMA JET CHEMICAL-VAPOR-DEPOSITION

Abstract

Carbon Nitride films have been grown on nickel substrates by magnetically rotated arc-plasma jet chemical vapor deposition (CVD). These films were characterized by scanning electron microscopy (SEM), wavelength dispersive X-ray spectrometry (WDS) transmission electron microscopy (TEM), and Raman spectroscopy. Small grains (similar to 0.1 mu m) as well as nanocrystallites found in the films were identified to be beta-C3N4. Raman spectrum also confirmed the existence of beta-C3N4 phase in the films through three pronounced Raman bands at low frequency as expected from the Hooke's law approximation.