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dc.contributor.authorJuan, C. P.en_US
dc.contributor.authorTsai, C. C.en_US
dc.contributor.authorChen, K. J.en_US
dc.contributor.authorHong, W. K.en_US
dc.contributor.authorLin, K. C.en_US
dc.contributor.authorHsieh, C. Y.en_US
dc.contributor.authorWang, W. P.en_US
dc.contributor.authorLai, R. L.en_US
dc.contributor.authorCheng, H. C.en_US
dc.contributor.authorChen, K. H.en_US
dc.contributor.authorChen, L. C.en_US
dc.date.accessioned2014-12-08T15:25:48Z-
dc.date.available2014-12-08T15:25:48Z-
dc.date.issued2004en_US
dc.identifier.isbn978-7-81089-529-3en_US
dc.identifier.urihttp://hdl.handle.net/11536/18244-
dc.description.abstractThe density distribution of the CNTs is one of the crucial parameters for the field emission property of CNTs.We use an inactive thin film layer that was deposited on the catalyst to effectively control the density of the CNTs. The results showed the improved field emission property could be obtained with a thin SiO layer on the catalyst layer as the precursor. For the 3.5 nm Fe and 3.5 nm SiO on 3.5 nm Fe as the catalyst, the turn-on field can be reduced from 3.7 V/ mu m. to 2.2 V/ mu m and the field emission current density increased from 2.6x 10(-8) A/cm(2) to 2.4x 10(-4) A/cm(2) when the applied field was 4 V/mu m. The extremely low turn-on field of 1.3 V/ mu m was also discovered for the CNTs grown with the precursor contained 1.5 nm SiO on 1.5 nm Fe; the extremely high emission current density of 4x 10(-2) A/cm(2) was also achieved under the low electric field of 3.5 V/ mu m.en_US
dc.language.isoen_USen_US
dc.subjectcarbon nanotubesen_US
dc.subjectinactive thin film layeren_US
dc.subjectdensity control of the CNTsen_US
dc.titleControlled density growth of carbon nanotubes and its improvement on field emission propertiesen_US
dc.typeProceedings Paperen_US
dc.identifier.journalASID'04: Proceedings of the 8th Asian Symposium on Information Displayen_US
dc.citation.spage420en_US
dc.citation.epage423en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000250669100108-
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