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dc.contributor.authorWu, HHen_US
dc.contributor.authorWu, HSen_US
dc.contributor.authorTzuang, CKCen_US
dc.date.accessioned2014-12-08T15:25:58Z-
dc.date.available2014-12-08T15:25:58Z-
dc.date.issued2004en_US
dc.identifier.isbn0-7803-8703-1en_US
dc.identifier.urihttp://hdl.handle.net/11536/18418-
dc.description.abstractA synthetic quasi-TEM CMOS transmission line (TL) of wide range characteristic impedance from 58.3 to 95 Omega is presented for miniaturization of CMOS RFIC. The synthetic TL consists of unit cells made of complementary-conducting strips (CCS) and connecting arm for signal interface residing on the M5 and M1 metal layers of a typical 0.25 mu m 1P5M CMOS process. Measured results and theoretical data indicate that the loss per guiding Wavelength of the meandered CCS TL is about 13 % lower than that of the meandered microstrip of characteristic impedance 86.4 Omega at 40 GHz.en_US
dc.language.isoen_USen_US
dc.subjectquasi-TEM transmission lineen_US
dc.subjectCMOSen_US
dc.titleSynthesized high-impedance CMOS thin-film transmission lineen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2004 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems, Digest of Papersen_US
dc.citation.spage302en_US
dc.citation.epage304en_US
dc.contributor.department傳播研究所zh_TW
dc.contributor.departmentInstitute of Communication Studiesen_US
dc.identifier.wosnumberWOS:000228081500078-
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