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dc.contributor.authorLiu, TAen_US
dc.contributor.authorTani, Men_US
dc.contributor.authorLin, GRen_US
dc.contributor.authorPan, CLen_US
dc.date.accessioned2014-12-08T15:26:06Z-
dc.date.available2014-12-08T15:26:06Z-
dc.date.issued2003en_US
dc.identifier.isbn3-540-00089-5en_US
dc.identifier.issn0172-6218en_US
dc.identifier.urihttp://hdl.handle.net/11536/18503-
dc.description.abstractWe compare the performance of THz dipole antennas fabricated on Multi-energy arsenic-ion-implanted GaAs (multi-GaAs:As+) and Semi-insulating (S. I.) GaAs. High damage threshold biasing (> 60 kV/cm) and large saturating optical pumping power (> 30 mW) for multi-GaAs:As+ based devices are reported.en_US
dc.language.isoen_USen_US
dc.titleTHz emission characteristics of dipole antennas fabricated on multi-energy arsenic-ionimplanted GaAs and semi-insulating GaAsen_US
dc.typeProceedings Paperen_US
dc.identifier.journalULTRAFAST PHENOMENA XIIIen_US
dc.citation.volume71en_US
dc.citation.spage277en_US
dc.citation.epage279en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000182432900086-
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