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dc.contributor.authorYeh, CFen_US
dc.contributor.authorHsiao, CWen_US
dc.contributor.authorLin, SJen_US
dc.contributor.authorXie, ZMen_US
dc.contributor.authorKusumi, Ten_US
dc.contributor.authorAomi, Hen_US
dc.contributor.authorKaneko, Hen_US
dc.contributor.authorDa, BTen_US
dc.contributor.authorTsai, MSen_US
dc.date.accessioned2014-12-08T15:26:34Z-
dc.date.available2014-12-08T15:26:34Z-
dc.date.issued2002en_US
dc.identifier.isbn0-7803-7538-6en_US
dc.identifier.urihttp://hdl.handle.net/11536/18871-
dc.description.abstractIn this paper, we detected most airborne molecular contamination (AMC) in present cleanroom and in our specially equipped clean bench through air sampling and wafer sampling experiments. And then we investigate the AMC on device performance under different filter modules. We discovered that the NEUROFINE PTFE filter combines with the chemical filters have excellent controlling ability of metal, organic and inorganic contaminations. We believe that the novel filter combination can be used to further improve device manufacturing environment when device is continuously scaled down to nanometer generation.en_US
dc.language.isoen_USen_US
dc.titleImpact of airborne molecular contamination to nano-device performanceen_US
dc.typeProceedings Paperen_US
dc.identifier.journalPROCEEDINGS OF THE 2002 2ND IEEE CONFERENCE ON NANOTECHNOLOGYen_US
dc.citation.spage461en_US
dc.citation.epage464en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000178016200110-
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