Process and doping species dependence of negative-bias-temperature instability for p-channel MOSFETs

Abstract

The effects of poly-Si gate doping type and species on the negative-bias-temperature instability (NBTI) of p-channel MOS transistors were investigated. We found that, by properly suppressing boron penetration through careful thermal budget, NBTI can be reduced by proper fluorine incorporation. In addition, we found that NBTI is larger for devices with PMA annealing, thus clearly identified the role of hydrogen passivation in NBTI.