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dc.contributor.authorFang, CYen_US
dc.contributor.authorLin, CFen_US
dc.contributor.authorLee, CSen_US
dc.contributor.authorChang, EYen_US
dc.contributor.authorFeng, MSen_US
dc.date.accessioned2014-12-08T15:26:53Z-
dc.date.available2014-12-08T15:26:53Z-
dc.date.issued2001en_US
dc.identifier.isbn1-56677-353-9en_US
dc.identifier.urihttp://hdl.handle.net/11536/19125-
dc.description.abstractAl0.1Ga0.9N/GaN HEMTs (High Electron Mobility Transistor) structures with different delta-doping concentration and spacer thickness grown on sapphire by MOCVD are studied. The hall mobility is as high as 1333 cm(2)/V s. at room temperature and 6330 cm(2)/V s at 77 K. Obvious 2-DEG phenomena not clearly resolved in literatures before are observed by PL spectra measured at low temperature. The influences of delta-doping concentration and spacer thickness on the 2-DEG phenomena are discussed. Peaks red-shift of different HEMT structures due to temperature variation are observed in 2-DEG sub-bands as well as at the band-edge emission that is believed as a strong evidence of 2DEG sub-bands to valence bands transmission.en_US
dc.language.isoen_USen_US
dc.titleAIGaN/GaN HEMT sub-bands study using low-temperature photoluminescenceen_US
dc.typeProceedings Paperen_US
dc.identifier.journalSTATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS (SOTAPOCS XXXV)en_US
dc.citation.volume2001en_US
dc.citation.issue20en_US
dc.citation.spage96en_US
dc.citation.epage102en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000180622600014-
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