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DC FieldValueLanguage
dc.contributor.authorLIOU, BWen_US
dc.contributor.authorWU, YHen_US
dc.contributor.authorLEE, CLen_US
dc.contributor.authorLEI, TFen_US
dc.date.accessioned2014-12-08T15:03:22Z-
dc.date.available2014-12-08T15:03:22Z-
dc.date.issued1995-05-29en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.114261en_US
dc.identifier.urihttp://hdl.handle.net/11536/1912-
dc.language.isoen_USen_US
dc.titleTHICKNESS EFFECT ON HYDROGEN PLASMA TREATMENT ON POLYCRYSTALLINE SILICON THIN-FILMSen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.114261en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume66en_US
dc.citation.issue22en_US
dc.citation.spage3013en_US
dc.citation.epage3014en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1995QZ88800030-
dc.citation.woscount5-
Appears in Collections:Articles


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