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dc.contributor.authorWang, H. W.en_US
dc.contributor.authorChen, H. C.en_US
dc.contributor.authorChang, Y. A.en_US
dc.contributor.authorLin, C. C.en_US
dc.contributor.authorHan, H. W.en_US
dc.contributor.authorTsai, M. A.en_US
dc.contributor.authorKuo, H. C.en_US
dc.contributor.authorYu, P.en_US
dc.contributor.authorLin, S. H.en_US
dc.date.accessioned2014-12-08T15:26:55Z-
dc.date.available2014-12-08T15:26:55Z-
dc.date.issued2011-09-15en_US
dc.identifier.issn1041-1135en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LPT.2011.2160051en_US
dc.identifier.urihttp://hdl.handle.net/11536/19148-
dc.description.abstractIn this study, p-i-n double-heterojunction GaN/In(0.11)Ga(0.89)N solar cells grown by metal-organic chemical vapor deposition on pattern sapphire substrate are presented. The solar cell with standard process has a conversion efficiency of 3.1%, which corresponds to a fill factor of 58%, short circuit current density of 2.86 mA/cm(2), and open circuit voltage of 1.87 V under AM1.5G illumination. To further improve the conversion efficiency of the GaN/In(0.11)Ga(0.89)N solar cells, two-dimensional polystyrene nanospheres were deposited and self-organized as mask in the anisotropic inductively coupled plasma reactive ion etching process to form a biomimetic surface roughing texture. The surface morphology of the solar cell shows a periodically hexagonal bead pattern and the beads are formed in a diameter of 160 nm with a period of 250 nm. An increase of 15% in short circuit current density is found, thus improving the conversion efficiency to 3.87%. If we optimize the structure for 180 nm of the height and 375 nm of the period, a 10% gain can be expected when compared to the current structure.en_US
dc.language.isoen_USen_US
dc.titleConversion Efficiency Enhancement of GaN/In(0.11)Ga(0.89)N Solar Cells With Nano Patterned Sapphire and Biomimetic Surface Antireflection Processen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LPT.2011.2160051en_US
dc.identifier.journalIEEE PHOTONICS TECHNOLOGY LETTERSen_US
dc.citation.volume23en_US
dc.citation.issue18en_US
dc.citation.spage1304en_US
dc.citation.epage1306en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
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