完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Wang, H. W. | en_US |
dc.contributor.author | Chen, H. C. | en_US |
dc.contributor.author | Chang, Y. A. | en_US |
dc.contributor.author | Lin, C. C. | en_US |
dc.contributor.author | Han, H. W. | en_US |
dc.contributor.author | Tsai, M. A. | en_US |
dc.contributor.author | Kuo, H. C. | en_US |
dc.contributor.author | Yu, P. | en_US |
dc.contributor.author | Lin, S. H. | en_US |
dc.date.accessioned | 2014-12-08T15:26:55Z | - |
dc.date.available | 2014-12-08T15:26:55Z | - |
dc.date.issued | 2011-09-15 | en_US |
dc.identifier.issn | 1041-1135 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/LPT.2011.2160051 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/19148 | - |
dc.description.abstract | In this study, p-i-n double-heterojunction GaN/In(0.11)Ga(0.89)N solar cells grown by metal-organic chemical vapor deposition on pattern sapphire substrate are presented. The solar cell with standard process has a conversion efficiency of 3.1%, which corresponds to a fill factor of 58%, short circuit current density of 2.86 mA/cm(2), and open circuit voltage of 1.87 V under AM1.5G illumination. To further improve the conversion efficiency of the GaN/In(0.11)Ga(0.89)N solar cells, two-dimensional polystyrene nanospheres were deposited and self-organized as mask in the anisotropic inductively coupled plasma reactive ion etching process to form a biomimetic surface roughing texture. The surface morphology of the solar cell shows a periodically hexagonal bead pattern and the beads are formed in a diameter of 160 nm with a period of 250 nm. An increase of 15% in short circuit current density is found, thus improving the conversion efficiency to 3.87%. If we optimize the structure for 180 nm of the height and 375 nm of the period, a 10% gain can be expected when compared to the current structure. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Conversion Efficiency Enhancement of GaN/In(0.11)Ga(0.89)N Solar Cells With Nano Patterned Sapphire and Biomimetic Surface Antireflection Process | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/LPT.2011.2160051 | en_US |
dc.identifier.journal | IEEE PHOTONICS TECHNOLOGY LETTERS | en_US |
dc.citation.volume | 23 | en_US |
dc.citation.issue | 18 | en_US |
dc.citation.spage | 1304 | en_US |
dc.citation.epage | 1306 | en_US |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Electrophysics | en_US |
dc.contributor.department | Department of Photonics | en_US |
顯示於類別: | 期刊論文 |