標題: | GROWTH OF EPITAXIAL-LIKE (SR0.5BA0.5)NB2O6 FERROELECTRIC-FILMS |
作者: | LIN, WJ TSENG, TY LIN, SP TU, SL YANG, SJ HARN, JJ LIU, KS LIN, IN 電子工程學系及電子研究所 電控工程研究所 Department of Electronics Engineering and Institute of Electronics Institute of Electrical and Control Engineering |
關鍵字: | SBN;EPITAXIAL;FERROELECTRIC;HYSTERESIS;THIN FILMS |
公開日期: | 15-五月-1995 |
摘要: | Epitaxial-like (Sr0.5Ba0.5)Nb2O6 (SBN) films were successfully grown on (100) silicon substrates, using [002] CeO2 as the buffer layer and [001]YBa2Cu3O7-x (YBCO) as the base electrode. The theta-2 theta scan and phi-scan X-ray diffraction suggest that [210](SBN)//[100](YBCO)//[110]CeO2//[110](si). The ferroelectric hysteresis curves measured by the modified Sawyer-Tower technique show that the epitaxial-like SBN/YBCO/CeO2/Si films possess substantially better ferroelectricity than the polycrystalline SBN/Pt(Ti)/Si films. The remanent polarization (P-r) and coercive field (E(c)) are, respectively, P-r = 27.2 mu C/cm(2) and E(c) = 24.8 kV/cm. |
URI: | http://dx.doi.org/10.1143/JJAP.34.L625 http://hdl.handle.net/11536/1921 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.34.L625 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS |
Volume: | 34 |
Issue: | 5B |
起始頁: | L625 |
結束頁: | L627 |
顯示於類別: | 期刊論文 |