Title: | GROWTH OF EPITAXIAL-LIKE (SR0.5BA0.5)NB2O6 FERROELECTRIC-FILMS |
Authors: | LIN, WJ TSENG, TY LIN, SP TU, SL YANG, SJ HARN, JJ LIU, KS LIN, IN 電子工程學系及電子研究所 電控工程研究所 Department of Electronics Engineering and Institute of Electronics Institute of Electrical and Control Engineering |
Keywords: | SBN;EPITAXIAL;FERROELECTRIC;HYSTERESIS;THIN FILMS |
Issue Date: | 15-May-1995 |
Abstract: | Epitaxial-like (Sr0.5Ba0.5)Nb2O6 (SBN) films were successfully grown on (100) silicon substrates, using [002] CeO2 as the buffer layer and [001]YBa2Cu3O7-x (YBCO) as the base electrode. The theta-2 theta scan and phi-scan X-ray diffraction suggest that [210](SBN)//[100](YBCO)//[110]CeO2//[110](si). The ferroelectric hysteresis curves measured by the modified Sawyer-Tower technique show that the epitaxial-like SBN/YBCO/CeO2/Si films possess substantially better ferroelectricity than the polycrystalline SBN/Pt(Ti)/Si films. The remanent polarization (P-r) and coercive field (E(c)) are, respectively, P-r = 27.2 mu C/cm(2) and E(c) = 24.8 kV/cm. |
URI: | http://dx.doi.org/10.1143/JJAP.34.L625 http://hdl.handle.net/11536/1921 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.34.L625 |
Journal: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS |
Volume: | 34 |
Issue: | 5B |
Begin Page: | L625 |
End Page: | L627 |
Appears in Collections: | Articles |
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