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dc.contributor.authorLIN, WJen_US
dc.contributor.authorTSENG, TYen_US
dc.contributor.authorLIN, SPen_US
dc.contributor.authorTU, SLen_US
dc.contributor.authorYANG, SJen_US
dc.contributor.authorHARN, JJen_US
dc.contributor.authorLIU, KSen_US
dc.contributor.authorLIN, INen_US
dc.date.accessioned2014-12-08T15:03:23Z-
dc.date.available2014-12-08T15:03:23Z-
dc.date.issued1995-05-15en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.34.L625en_US
dc.identifier.urihttp://hdl.handle.net/11536/1921-
dc.description.abstractEpitaxial-like (Sr0.5Ba0.5)Nb2O6 (SBN) films were successfully grown on (100) silicon substrates, using [002] CeO2 as the buffer layer and [001]YBa2Cu3O7-x (YBCO) as the base electrode. The theta-2 theta scan and phi-scan X-ray diffraction suggest that [210](SBN)//[100](YBCO)//[110]CeO2//[110](si). The ferroelectric hysteresis curves measured by the modified Sawyer-Tower technique show that the epitaxial-like SBN/YBCO/CeO2/Si films possess substantially better ferroelectricity than the polycrystalline SBN/Pt(Ti)/Si films. The remanent polarization (P-r) and coercive field (E(c)) are, respectively, P-r = 27.2 mu C/cm(2) and E(c) = 24.8 kV/cm.en_US
dc.language.isoen_USen_US
dc.subjectSBNen_US
dc.subjectEPITAXIALen_US
dc.subjectFERROELECTRICen_US
dc.subjectHYSTERESISen_US
dc.subjectTHIN FILMSen_US
dc.titleGROWTH OF EPITAXIAL-LIKE (SR0.5BA0.5)NB2O6 FERROELECTRIC-FILMSen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.34.L625en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERSen_US
dc.citation.volume34en_US
dc.citation.issue5Ben_US
dc.citation.spageL625en_US
dc.citation.epageL627en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:A1995RD78900010-
dc.citation.woscount8-
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