完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chung, HM | en_US |
dc.contributor.author | Pan, YC | en_US |
dc.contributor.author | Chung, WC | en_US |
dc.contributor.author | Chen, NC | en_US |
dc.contributor.author | Tsai, CC | en_US |
dc.contributor.author | Chiang, CI | en_US |
dc.contributor.author | Lin, CH | en_US |
dc.contributor.author | Chang, H | en_US |
dc.contributor.author | Lee, MC | en_US |
dc.contributor.author | Chen, WH | en_US |
dc.contributor.author | Chen, WK | en_US |
dc.date.accessioned | 2014-12-08T15:27:01Z | - |
dc.date.available | 2014-12-08T15:27:01Z | - |
dc.date.issued | 2000 | en_US |
dc.identifier.isbn | 4-900526-13-4 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/19232 | - |
dc.description.abstract | We have employed the photocapacitance measurement to examine the physical properties of GaN Schottky diode made from the undoped epilayer grown by metalorganic vapor phase epitaxy. The resulted transient capacitance spectrum shows that the diode exhibits a characteristic of long-term logarithmic-type decaying behavior, which, we believe, is correlated closely to the linear arranged traps close to the core of the threading edge dislocations. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | GaN | en_US |
dc.subject | photocapacitance | en_US |
dc.subject | logarithmic | en_US |
dc.title | Long-term photocapacitance decay behavior in undoped GaN | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.journal | PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS | en_US |
dc.citation.volume | 1 | en_US |
dc.citation.spage | 463 | en_US |
dc.citation.epage | 466 | en_US |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | Department of Electrophysics | en_US |
dc.identifier.wosnumber | WOS:000171608500118 | - |
顯示於類別: | 會議論文 |