Exposure schedule for multiplexing holograms in photopolymer

doi:10.1117/12.363923

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Lin, SAH	en_US
dc.contributor.author	Hsu, KY	en_US
dc.contributor.author	Chen, WZ	en_US
dc.contributor.author	Whang, WT	en_US
dc.date.accessioned	2014-12-08T15:27:09Z	-
dc.date.available	2014-12-08T15:27:09Z	-
dc.date.issued	1999	en_US
dc.identifier.isbn	0-8194-3287-3	en_US
dc.identifier.issn	0277-786X	en_US
dc.identifier.uri	http://hdl.handle.net/11536/19387	-
dc.identifier.uri	http://dx.doi.org/10.1117/12.363923	en_US
dc.description.abstract	We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photo-polymer materials with similar kinetics.	en_US
dc.language.iso	en_US	en_US
dc.subject	photopolymer material	en_US
dc.subject	PMMA	en_US
dc.subject	Holographic data storage	en_US
dc.subject	multiplexing schedule	en_US
dc.subject	dynamic range	en_US
dc.title	Exposure schedule for multiplexing holograms in photopolymer	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.doi	10.1117/12.363923	en_US
dc.identifier.journal	PHOTOREFRACTIVE FIBER AND CRYSTAL DEVICES: MATERIALS, OPTICAL PROPERTIES, AND APPLICATIONS V	en_US
dc.citation.volume	3801	en_US
dc.citation.spage	100	en_US
dc.citation.epage	106	en_US
dc.contributor.department	光電工程學系	zh_TW
dc.contributor.department	Department of Photonics	en_US
dc.identifier.wosnumber	WOS:000083314900012	-
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