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dc.contributor.authorWang, SYen_US
dc.contributor.authorLee, CPen_US
dc.date.accessioned2014-12-08T15:27:17Z-
dc.date.available2014-12-08T15:27:17Z-
dc.date.issued1998en_US
dc.identifier.isbn0-7923-8164-5en_US
dc.identifier.urihttp://hdl.handle.net/11536/19535-
dc.description.abstractBy using highly doped InGaAs quantum wells, grating-free two color quantum well infrared photodetectors with large normal incidence responses have been demonstrated. Two different structures were used for different voltage tuning characteristics. The In0.3Ga0.65As/Al0.3Ga0.7As quantum wells with 3.5x10(18) cm(-3) Si doping were used to fabricated MWIR QWIP with bound to bound transition and bound to continuum transition. In0.3Ga0.7As/GaAs quantum wells with 1x10(18) cm(-3) Si doping were used to fabricate LWIR QWIP with bound to continuum transition and bound to quasi continuum transition. The MWIR QWIP and LWIR QWIP were stacked together for two-color operation. The grating-free devices were measured with normal incident infrared radiation and compared with those with surface grating. Very good responses were obtained from grating-free devices with the TE to TM response ratio around 50-35% for both wavelength ranges. Due to a higher resistance, the MWIR stack turned on at lower voltages than the LWIR stack. The voltage tuning characteristics of the two structures were studied.en_US
dc.language.isoen_USen_US
dc.titleNormal incident two color voltage tunable InGaAs quantum well infrared photodetectorsen_US
dc.typeProceedings Paperen_US
dc.identifier.journalINTERSUBBAND TRANSITIONS IN QUANTUM WELLS: PHYSICS AND DEVICESen_US
dc.citation.spage110en_US
dc.citation.epage115en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000081415100016-
Appears in Collections:Conferences Paper