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dc.contributor.authorLai, YLen_US
dc.contributor.authorChan, EYen_US
dc.contributor.authorChang, CYen_US
dc.contributor.authorLiu, THen_US
dc.contributor.authorWang, SPen_US
dc.date.accessioned2014-12-08T15:27:38Z-
dc.date.available2014-12-08T15:27:38Z-
dc.date.issued1996en_US
dc.identifier.isbn0-7803-3388-8en_US
dc.identifier.urihttp://hdl.handle.net/11536/19895-
dc.description.abstractA high-performance pseudomorphic high electron mobility transistor (HEMT) with high output power density and high power-added efficiency for low-voltage wireless communication applications has been developed. This paper describes the de and microwave performance of the pseudomorphic AlGaAs/InGaAs HEMT developed. The 1 um gate-length HEMT exhibited a maximum drain current of 470 mA/mm at V-gs = +1.0 V. The maximum transconductance of the device was 280 mS/mm. At a drain bias of 3.0 V and a measurement frequency of 900 MHz, the 2mm-wide HEMT demonstrated an output power of 26.1 dBm ( a power density of 204 mW/mm) and a power-added efficiency of 65 % under the class AB condition while an output power of 26.7 dBm (234 mW/mm) and a power-added efficiency of 60 % were obtained under the class A condition. The developed pseudomorphic power HEMT developed achieves the highest output power density ever reported among the GaAs devices operating at 3.0 V.en_US
dc.language.isoen_USen_US
dc.titleHigh-performance pseudomorphic power HEMTs for low-voltage wireless communication applicationsen_US
dc.typeProceedings Paperen_US
dc.identifier.journalICSE '96 - 1996 IEEE INTERNATIONAL CONFERENCE ON SEMICONDUCTOR ELECTRONICS, PROCEEDINGSen_US
dc.citation.spage225en_US
dc.citation.epage228en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1996BJ54J00050-
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