完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | LAI, CH | en_US |
dc.contributor.author | WENG, CT | en_US |
dc.contributor.author | TSENG, TY | en_US |
dc.date.accessioned | 2014-12-08T15:03:27Z | - |
dc.date.available | 2014-12-08T15:03:27Z | - |
dc.date.issued | 1995-04-01 | en_US |
dc.identifier.issn | 0254-0584 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/1990 | - |
dc.description.abstract | The influences of Nd donors and Al2O3-SiO2-TiO2 (AST) sintering aids on the electrical properties of (Ba,Sr)TiO3 materials have been investigated. The room-temperature resistivity and the temperature coefficient of the anomalous resistivity rise were used to characterize the performance of the samples. From derivations based on the Heywang-Jonker barrier model, both characterizing parameters are expected to increase as a result of higher acceptor-state density at the grain boundary. The surface acceptor density, whose value was extracted from the slope in the Arrhenius plot of resistivity versus 1/(T epsilon(m)), where epsilon(m) is the measured permittivity and T the absolute temperature, was found to decrease with the Nd content and increase with the AST dopant. A satisfactory interpretation of the observed variations in resistivity-temperature curves caused by additions of various dopants was thus obtained in the light of the resultant acceptor state density. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | POSITIVE TEMPERATURE COEFFICIENT OF RESISTANCE | en_US |
dc.subject | ACCEPTOR STATE DENSITY | en_US |
dc.subject | GRAIN BOUNDARIES | en_US |
dc.subject | PERMITTIVITY | en_US |
dc.subject | BARRIERS | en_US |
dc.title | THE EFFECTS OF ND2O3 ADDITIVES AND AL2O3-SIO2-TIO2 SINTERING AIDS ON THE ELECTRICAL-RESISTIVITY OF (BA,SR)TIO3 PTCR CERAMICS | en_US |
dc.type | Article | en_US |
dc.identifier.journal | MATERIALS CHEMISTRY AND PHYSICS | en_US |
dc.citation.volume | 40 | en_US |
dc.citation.issue | 3 | en_US |
dc.citation.spage | 168 | en_US |
dc.citation.epage | 172 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:A1995RA33600003 | - |
dc.citation.woscount | 6 | - |
顯示於類別: | 期刊論文 |