Low temperature processed poly-Si thin-film transistors with thinner LPD-SiO2 as gate insulator and its reliability

標題:	Low temperature processed poly-Si thin-film transistors with thinner LPD-SiO2 as gate insulator and its reliability
作者:	Fan, CL Yeh, CF Tsai, HK Lur, W Yen, PW 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
公開日期:	1995
URI:	http://hdl.handle.net/11536/19938
ISBN:	0-7803-3056-0
期刊:	AMLCDS '95 - SECOND INTERNATIONAL WORKSHOP ON ACTIVE MATRIX LIQUID CRYSTAL DISPLAYS, WORKSHOP PROCEEDINGS
起始頁:	93
結束頁:	96
顯示於類別：	會議論文