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dc.contributor.authorFan, CLen_US
dc.contributor.authorYeh, CFen_US
dc.contributor.authorTsai, HKen_US
dc.contributor.authorLur, Wen_US
dc.contributor.authorYen, PWen_US
dc.date.accessioned2014-12-08T15:27:41Z-
dc.date.available2014-12-08T15:27:41Z-
dc.date.issued1995en_US
dc.identifier.isbn0-7803-3056-0en_US
dc.identifier.urihttp://hdl.handle.net/11536/19938-
dc.language.isoen_USen_US
dc.titleLow temperature processed poly-Si thin-film transistors with thinner LPD-SiO2 as gate insulator and its reliabilityen_US
dc.typeProceedings Paperen_US
dc.identifier.journalAMLCDS '95 - SECOND INTERNATIONAL WORKSHOP ON ACTIVE MATRIX LIQUID CRYSTAL DISPLAYS, WORKSHOP PROCEEDINGSen_US
dc.citation.spage93en_US
dc.citation.epage96en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1995BG36H00020-
Appears in Collections:Conferences Paper


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