標題: Gate oxynitride grown in N2O and annealed in no using rapid thermal processing
作者: Sun, SC
Chen, CH
Lou, JC
Yen, LW
Lin, CJ
電機學院
College of Electrical and Computer Engineering
公開日期: 1995
URI: http://hdl.handle.net/11536/20005
ISBN: 1-55899-290-1
ISSN: 0272-9172
期刊: RAPID THERMAL AND INTEGRATED PROCESSING IV
Volume: 387
起始頁: 241
結束頁: 246
顯示於類別:會議論文