1. You are Here：

Full metadata record
DC FieldValueLanguage
dc.contributor.authorSUN, SCen_US
dc.contributor.authorYEH, FLen_US
dc.contributor.authorTIEN, HZen_US
dc.date.accessioned2014-12-08T15:27:49Z-
dc.date.available2014-12-08T15:27:49Z-
dc.date.issued1994en_US
dc.identifier.isbn1-55899-237-5en_US
dc.identifier.issn0272-9172en_US
dc.identifier.urihttp://hdl.handle.net/11536/20056-
dc.language.isoen_USen_US
dc.titleCHARACTERIZATION OF CHEMICAL-MECHANICAL POLISHING DIELECTRICS FOR MULTILEVEL METALLIZATIONen_US
dc.typeProceedings Paperen_US
dc.identifier.journalADVANCED METALLIZATION FOR DEVICES AND CIRCUITS - SCIENCE, TECHNOLOGY AND MANUFACTURABILITYen_US
dc.citation.volume337en_US
dc.citation.spage139en_US
dc.citation.epage144en_US
dc.contributor.department奈米中心zh_TW
dc.contributor.departmentNano Facility Centeren_US
dc.identifier.wosnumberWOS:A1994BB59J00014-
Appears in Collections:Conferences Paper


Related Contents
Loading...