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dc.contributor.authorSUN, SCen_US
dc.contributor.authorCHEN, TFen_US
dc.date.accessioned2014-12-08T15:27:51Z-
dc.date.available2014-12-08T15:27:51Z-
dc.date.issued1994en_US
dc.identifier.isbn0-7803-2111-1en_US
dc.identifier.urihttp://hdl.handle.net/11536/20109-
dc.language.isoen_USen_US
dc.titleA NOVEL APPROACH FOR LEAKAGE CURRENT REDUCTION OF LPCVD TA(2)O(5) AND TIO(2) FILMS BY RAPID THERMAL N(2)O ANNEALINGen_US
dc.typeProceedings Paperen_US
dc.identifier.journalINTERNATIONAL ELECTRON DEVICES MEETING 1994 - IEDM TECHNICAL DIGESTen_US
dc.citation.spage333en_US
dc.citation.epage336en_US
dc.contributor.department奈米中心zh_TW
dc.contributor.departmentNano Facility Centeren_US
dc.identifier.wosnumberWOS:A1994BC55U00076-
Appears in Collections:Conferences Paper