A NOVEL APPROACH FOR LEAKAGE CURRENT REDUCTION OF LPCVD TA(2)O(5) AND TIO(2) FILMS BY RAPID THERMAL N(2)O ANNEALING

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	SUN, SC	en_US
dc.contributor.author	CHEN, TF	en_US
dc.date.accessioned	2014-12-08T15:27:51Z	-
dc.date.available	2014-12-08T15:27:51Z	-
dc.date.issued	1994	en_US
dc.identifier.isbn	0-7803-2111-1	en_US
dc.identifier.uri	http://hdl.handle.net/11536/20109	-
dc.language.iso	en_US	en_US
dc.title	A NOVEL APPROACH FOR LEAKAGE CURRENT REDUCTION OF LPCVD TA(2)O(5) AND TIO(2) FILMS BY RAPID THERMAL N(2)O ANNEALING	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.journal	INTERNATIONAL ELECTRON DEVICES MEETING 1994 - IEDM TECHNICAL DIGEST	en_US
dc.citation.spage	333	en_US
dc.citation.epage	336	en_US
dc.contributor.department	奈米中心	zh_TW
dc.contributor.department	Nano Facility Center	en_US
dc.identifier.wosnumber	WOS:A1994BC55U00076	-
顯示於類別：	會議論文