Al2O3 films formed by anodic oxidation of Al-1wt.%Si-0.5wt%Cu films

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	CHIU, S	en_US
dc.contributor.author	CHANG, PH	en_US
dc.contributor.author	TUNG, CH	en_US
dc.date.accessioned	2014-12-08T15:27:53Z	-
dc.date.available	2014-12-08T15:27:53Z	-
dc.date.issued	1994	en_US
dc.identifier.isbn	3-88355-199-6	en_US
dc.identifier.uri	http://hdl.handle.net/11536/20150	-
dc.language.iso	en_US	en_US
dc.title	Al2O3 films formed by anodic oxidation of Al-1wt.%Si-0.5wt%Cu films	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.journal	THIN FILMS: PROCEEDINGS OF THE JOINT 4TH INTERNATIONAL SYMPOSIUM ON TRENDS AND NEW APPLICATIONS IN THIN FILMS - TATF '94 AND THE 11TH CONFERENCE ON HIGH VACUUM, INTERFACES AND THIN FILMS - HVITF '94	en_US
dc.citation.spage	662	en_US
dc.citation.epage	665	en_US
dc.contributor.department	材料科學與工程學系	zh_TW
dc.contributor.department	Department of Materials Science and Engineering	en_US
dc.identifier.wosnumber	WOS:A1994BD74L00146	-
顯示於類別：	會議論文