完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Hung, Shih-Wei | en_US |
dc.contributor.author | Wang, Terry Tai-Jui | en_US |
dc.contributor.author | Chu, Li-Wei | en_US |
dc.contributor.author | Chen, Lih-Juann | en_US |
dc.date.accessioned | 2014-12-08T15:28:09Z | - |
dc.date.available | 2014-12-08T15:28:09Z | - |
dc.date.issued | 2011-08-11 | en_US |
dc.identifier.issn | 1932-7447 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1021/jp201395r | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/20384 | - |
dc.description.abstract | Self-catalyzed growth of FeSi nanowires has been achieved via a spontaneous chemical reaction method. The room-temperature ferromagnetism behavior compared to that of bulk FeSi at 4 K is attributed to the enhancement of magnetic coupling behavior correlated to different crystalline orientations. The resistivity of the single-stem FeSi nanowire was determined to be 2650 mu Omega.cm. The fabricated memory devices based on FeSi nanowires showed significant C-V hysteresis, exhibiting the memory effect. The strong memory effect can be accounted for by the presence of defects or dangling bonds on the surface of the FeSi nanowires embedded in the SiO(2) layer, which enhances the trapping density for nonvolatile memory applications. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Orientation-Dependent Room-Temperature Ferromagnetism of FeSi Nanowires and Applications in Nonvolatile Memory Devices | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1021/jp201395r | en_US |
dc.identifier.journal | JOURNAL OF PHYSICAL CHEMISTRY C | en_US |
dc.citation.volume | 115 | en_US |
dc.citation.issue | 31 | en_US |
dc.citation.spage | 15592 | en_US |
dc.citation.epage | 15597 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000293419700060 | - |
dc.citation.woscount | 8 | - |
顯示於類別: | 期刊論文 |