標題: Accurate Process-Hotspot Detection Using Critical Design Rule Extraction
作者: Yu, Yen-Ting
Chan, Ya-Chung
Sinha, Subarna
Jiang, Iris Hui-Ru
Chiang, Charles
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: Design for manufacturability;process hotspot;pattern matching;design rule checking;lithography
公開日期: 2012
摘要: In advanced fabrication technology, the sub-wavelength lithography gap causes unwanted layout distortions. Even if a layout passes design rule checking (DRC), it still might contain process hotspots, which are sensitive to the lithographic process. Hence, process-hotspot detection has become a crucial issue. In this paper, we propose an accurate process-hotspot detection framework. Unlike existing DRC-based works, we extract only critical design rules to express the topological features of hotspot patterns. We adopt a two-stage filtering process to locate all hotspots accurately and efficiently. Compared with state-of-the-art DRC-based works, our results show that our approach can reach 100% success rate with significant speedups.
URI: http://hdl.handle.net/11536/20560
ISBN: 978-1-4503-1199-1
ISSN: 0738-100X
期刊: 2012 49TH ACM/EDAC/IEEE DESIGN AUTOMATION CONFERENCE (DAC)
起始頁: 1163
結束頁: 1168
顯示於類別:會議論文