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dc.contributor.authorChao, Yen-Chuen_US
dc.contributor.authorWang, Kai-Rueien_US
dc.contributor.authorMeng, Hsin-Feien_US
dc.contributor.authorZan, Hsiao-Wenen_US
dc.contributor.authorHsu, Yung-Hsuanen_US
dc.date.accessioned2014-12-08T15:28:29Z-
dc.date.available2014-12-08T15:28:29Z-
dc.date.issued2012-12-01en_US
dc.identifier.issn1566-1199en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.orgel.2012.09.013en_US
dc.identifier.urihttp://hdl.handle.net/11536/20595-
dc.description.abstractIn this work, we proposed a fast and controllable blade coating process to form non-close-packed nanosphere structures. We investigated the key to obtain well-distributed non-close-packed PS spheres with blade coating. We utilized the blade-coated nanosphere structure to realize colloidal lithography and fabricate a vertical channel polymer transistor, the space-charge-limited transistor (SCLT). We demonstrated that SCLT utilizing blade-coated nanospheres delivered 13.9 mA/cm(2) at 1.8 V with an on/off current ratio as 45,000. The process of blade-coating nanospheres may facilitate the commercialization of low-cost colloidal lithography. (C) 2012 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectBlade coatingen_US
dc.subjectColloidal lithographyen_US
dc.subjectVertical channelen_US
dc.subjectPolymer transistoren_US
dc.titleLarge-area non-close-packed nanosphere deposition by blade coating for vertical space-charge-limited transistoren_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.orgel.2012.09.013en_US
dc.identifier.journalORGANIC ELECTRONICSen_US
dc.citation.volume13en_US
dc.citation.issue12en_US
dc.citation.spage3177en_US
dc.citation.epage3182en_US
dc.contributor.department物理研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentInstitute of Physicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000311681600056-
dc.citation.woscount2-
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