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dc.contributor.authorWang, Li-Chunen_US
dc.contributor.authorTang, Kea-Tiongen_US
dc.contributor.authorTeng, I-Juen_US
dc.contributor.authorKuo, Cheng-Tzuen_US
dc.contributor.authorHo, Cheng-Longen_US
dc.contributor.authorKuo, Han-Wenen_US
dc.contributor.authorSu, Tseng-Hsiungen_US
dc.contributor.authorYang, Shang-Renen_US
dc.contributor.authorShi, Gia-Nanen_US
dc.contributor.authorChang, Chang-Pingen_US
dc.date.accessioned2014-12-08T15:28:35Z-
dc.date.available2014-12-08T15:28:35Z-
dc.date.issued2011-08-01en_US
dc.identifier.issn1424-8220en_US
dc.identifier.urihttp://dx.doi.org/10.3390/s110807763en_US
dc.identifier.urihttp://hdl.handle.net/11536/20682-
dc.description.abstractThe goal of this research was to develop a chemical gas sensing device based on single-walled carbon nanotube (SWCNT) networks. The SWCNT networks are synthesized on Al(2)O(3)-deposted SiO(2)/Si substrates with 10 nm-thick Fe as the catalyst precursor layer using microwave plasma chemical vapor deposition (MPCVD). The development of interconnected SWCNT networks can be exploited to recognize the identities of different chemical gases by the strength of their particular surface adsorptive and desorptive responses to various types of chemical vapors. The physical responses on the surface of the SWCNT networks cause superficial changes in the electric charge that can be converted into electronic signals for identification. In this study, we tested NO(2) and NH(3) vapors at ppm levels at room temperature with our self-made gas sensing device, which was able to obtain responses to sensitivity changes with a concentration of 10 ppm for NO(2) and 24 ppm for NH(3).en_US
dc.language.isoen_USen_US
dc.subjectsingle-walled carbon nanotube (SWCNT) networksen_US
dc.subjectgas sensing deviceen_US
dc.subjectchemical vaporsen_US
dc.titleA Single-Walled Carbon Nanotube Network Gas Sensing Deviceen_US
dc.typeArticleen_US
dc.identifier.doi10.3390/s110807763en_US
dc.identifier.journalSENSORSen_US
dc.citation.volume11en_US
dc.citation.issue8en_US
dc.citation.spage7763en_US
dc.citation.epage7772en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000294253900027-
dc.citation.woscount9-
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