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DC 欄位語言
dc.contributor.authorChen, Yung-Linen_US
dc.contributor.authorHsieh, Sheng-Hsunen_US
dc.contributor.authorHung, Kuo-Enen_US
dc.contributor.authorYang, Shi-Wenen_US
dc.contributor.authorLi, Yung-Huien_US
dc.contributor.authorTien, Chung-Haoen_US
dc.date.accessioned2014-12-08T15:28:41Z-
dc.date.available2014-12-08T15:28:41Z-
dc.date.issued2012en_US
dc.identifier.isbn978-0-8194-9204-3en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/20757-
dc.identifier.urihttp://dx.doi.org/10.1117/12.928192en_US
dc.description.abstractUsing biometric signatures for identity recognition has been practiced for centuries. Recently, iris recognition system attracts much attention due to its high accuracy and high stability. The texture feature of iris provides a signature that is unique for each subject. Currently most commercial iris recognition systems acquire images in less than 50 cm, which is a serious constraint that needs to be broken if we want to use it for airport access or entrance that requires high turn-over rate. In order to capture the iris patterns from a distance, in this study, we developed a telephoto imaging system with image processing techniques. By using the cubic phase mask positioned front of the camera, the point spread function was kept constant over a wide range of defocus. With adequate decoding filter, the blurred image was restored, where the working distance between the subject and the camera can be achieved over 3m associated with 500mm focal length and aperture F/6.3. The simulation and experimental results validated the proposed scheme, where the depth of focus of iris camera was triply extended over the traditional optics, while keeping sufficient recognition accuracy.en_US
dc.language.isoen_USen_US
dc.subjectiris recognitionen_US
dc.subjectextended depth of fielden_US
dc.subjectcubic phase masken_US
dc.titleExtended depth of field system for long distance iris acquisitionen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1117/12.928192en_US
dc.identifier.journalNOVEL OPTICAL SYSTEMS DESIGN AND OPTIMIZATION XVen_US
dc.citation.volume8487en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000312205500020-
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