統計資料
總造訪次數
| 檢視 | |
|---|---|
| CHARACTERISTICS OF SELF-INDUCED LIGHTLY-DOPED-DRAIN POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS WITH LIQUID-PHASE DEPOSITION SIO2 AS GATE-INSULATOR AND PASSIVATION-LAYER | 102 |
本月總瀏覽
檔案下載
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| A1995QD76800016.pdf | 16 |
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| 中國 | 94 |
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| Shenzhen | 93 |
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