标题: Chemical vapor deposition of diamond on silicon substrates coated with adamantane in glycol chemical solutions
作者: Chen, Yi-Chun
Chang, Li
材料科学与工程学系
Department of Materials Science and Engineering
公开日期: 2013
摘要: Diamonds were synthesized on adamantane-coated mirror-polished Si (100) substrates by microwave plasma chemical vapor deposition (MPCVD) using a gas mixture of H-2 and CH4. Before MPCVD deposition, Si substrates were dip-coated in chemical solutions of ethylene glycol and diethylene glycol with adamantane. With the coating of adamantane, the diamond nucleation can be enhanced with a density over 1 x 10(8) cm(-2) and the deposited diamond films are shown to be of good crystallinity by scanning electron microscopy and Raman spectrometry. The study demonstrates a simple and efficient way of diamond deposition on a smooth Si substrate.
URI: http://hdl.handle.net/11536/21095
http://dx.doi.org/10.1039/c2ra22486k
ISSN: 2046-2069
DOI: 10.1039/c2ra22486k
期刊: RSC ADVANCES
Volume: 3
Issue: 5
起始页: 1514
结束页: 1518
显示于类别:Articles


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