Title: | A Novel Design Flow for Dummy Fill Using Boolean Mask Operations |
Authors: | Luo, Tseng-Chin Chao, Mango C. -T. Fisher, Philip A. Kuo, Chun-Ren 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
Keywords: | Boolean operation;dummy fill |
Issue Date: | 1-Aug-2012 |
Abstract: | Dummy fill has been demonstrated to be an effective technique to reduce process variation and improve manufacturability for advanced integrated circuit (IC) designs. However, the computation load, often several days for a realistic IC design, is a significant portion of the cycle time for delivering first silicon on new or modified designs. In this paper, we propose a novel design flow and dummy-fill algorithm based on Boolean operations, which greatly improves computational efficiency and pattern density uniformity, and enables dummy generation to be combined with the mask-preparation Boolean operations performed by the mask-fabrication facility. Mask data preparation can be performed in parallel with dummy generation and post-dummy simulation checks at the design house, resulting in improved first-silicon cycle time. Experimental results demonstrate these benefits in the context of an advanced foundry process technology. |
URI: | http://dx.doi.org/10.1109/TSM.2012.2190431 http://hdl.handle.net/11536/21120 |
ISSN: | 0894-6507 |
DOI: | 10.1109/TSM.2012.2190431 |
Journal: | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING |
Volume: | 25 |
Issue: | 3 |
Begin Page: | 468 |
End Page: | 479 |
Appears in Collections: | Conferences Paper |
Files in This Item:
If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.