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dc.contributor.authorPeng, Chun-Yenen_US
dc.contributor.authorWang, Wei-Linen_US
dc.contributor.authorHo, Yen-Tengen_US
dc.contributor.authorTian, Jr-Shengen_US
dc.contributor.authorChang, Lien_US
dc.date.accessioned2014-12-08T15:29:24Z-
dc.date.available2014-12-08T15:29:24Z-
dc.date.issued2013-03-01en_US
dc.identifier.issn0167-577Xen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.matlet.2012.12.003en_US
dc.identifier.urihttp://hdl.handle.net/11536/21187-
dc.description.abstractIn this study, interfacial structure of a-ZnO with misfit accommodation on r-sapphire at low and high growth temperatures (LT and HT) by pulsed laser deposition is presented. Along [1 (1) over bar 00](ZnO) of large lattice mismatch of ZnO with sapphire, TEM examinations show that a-type misfit dislocations are spaced 1.3-2.2 nm on HT-ZnO/sapphire interface, whereas dislocation pairs in spacing of 2.8-3.5 nm are observed for LT-ZnO/sapphire. For smaller lattice mismatch along the ZnO c-axis direction, reciprocal space maps of (11 (2) over bar(2) over bar)(ZnO) and (30 (3) over bar0)(sapphire) reflections show that HT-ZnO is nearly fully strained without much relaxation and has a highly coherent interface with sapphire, in contrast with partial relaxation in LT-ZnO. (C) 2012 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectNonpolar ZnOen_US
dc.subjectEpitaxial growthen_US
dc.subjectInterfacesen_US
dc.subjectHRTEMen_US
dc.subjectRSMen_US
dc.titleInterfacial structure of a-plane ZnO grown on r-plane sapphire by pulsed laser depositionen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.matlet.2012.12.003en_US
dc.identifier.journalMATERIALS LETTERSen_US
dc.citation.volume94en_US
dc.citation.issueen_US
dc.citation.spage165en_US
dc.citation.epage168en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000315254400045-
dc.citation.woscount5-
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