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dc.contributor.authorChen, Shih-Chengen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorChen, Shih-Yangen_US
dc.contributor.authorChen, Chi-Wenen_US
dc.contributor.authorChen, Shih-Chingen_US
dc.contributor.authorSze, S. M.en_US
dc.contributor.authorTsai, Ming-Jinnen_US
dc.contributor.authorKao, Ming-Jeren_US
dc.contributor.authorHuang, Fon-Shan Yehen_US
dc.date.accessioned2014-12-08T15:29:28Z-
dc.date.available2014-12-08T15:29:28Z-
dc.date.issued2011-08-01en_US
dc.identifier.issn0038-1101en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.sse.2010.12.014en_US
dc.identifier.urihttp://hdl.handle.net/11536/21205-
dc.description.abstractThis study investigates the resistance switching characteristics of Cr(2)O(3)-based resistance random access memory (RRAM) with Pt/Cr(2)O(3)/TiN and Pt/Cr(2)O(3)/Pt structures. Only devices with Pt/Cr(2)O(3)/TiN structure exhibit bipolar switching behavior after the forming process because TiN was able to work as an effective oxygen reservoir but Pt was not. Oxygen migration between Cr(2)O(3) and TiN was observed clearly before and after resistance switching from Auger electron spectroscopy (AES) analysis. Both low resistance state, ON state, and high resistance state, OFF state, of Pt/Cr(2)O(3)/TiN structures are stable and reproducible during a successive resistive switching. The resistance ratio of ON and OFF state is over 10(2), on top of that, the retention properties of both states are very stable after 10(4) s with a voltage of -0.2 V. (C) 2010 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectCr(2)O(3) thin filmen_US
dc.subjectResistance switchingen_US
dc.subjectNonvolatile memoryen_US
dc.titleBipolar resistive switching of chromium oxide for resistive random access memoryen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.sse.2010.12.014en_US
dc.identifier.journalSOLID-STATE ELECTRONICSen_US
dc.citation.volume62en_US
dc.citation.issue1en_US
dc.citation.spage40en_US
dc.citation.epage43en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000292444000007-
dc.citation.woscount17-
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