完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chen, Shih-Cheng | en_US |
dc.contributor.author | Chang, Ting-Chang | en_US |
dc.contributor.author | Chen, Shih-Yang | en_US |
dc.contributor.author | Chen, Chi-Wen | en_US |
dc.contributor.author | Chen, Shih-Ching | en_US |
dc.contributor.author | Sze, S. M. | en_US |
dc.contributor.author | Tsai, Ming-Jinn | en_US |
dc.contributor.author | Kao, Ming-Jer | en_US |
dc.contributor.author | Huang, Fon-Shan Yeh | en_US |
dc.date.accessioned | 2014-12-08T15:29:28Z | - |
dc.date.available | 2014-12-08T15:29:28Z | - |
dc.date.issued | 2011-08-01 | en_US |
dc.identifier.issn | 0038-1101 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.sse.2010.12.014 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/21205 | - |
dc.description.abstract | This study investigates the resistance switching characteristics of Cr(2)O(3)-based resistance random access memory (RRAM) with Pt/Cr(2)O(3)/TiN and Pt/Cr(2)O(3)/Pt structures. Only devices with Pt/Cr(2)O(3)/TiN structure exhibit bipolar switching behavior after the forming process because TiN was able to work as an effective oxygen reservoir but Pt was not. Oxygen migration between Cr(2)O(3) and TiN was observed clearly before and after resistance switching from Auger electron spectroscopy (AES) analysis. Both low resistance state, ON state, and high resistance state, OFF state, of Pt/Cr(2)O(3)/TiN structures are stable and reproducible during a successive resistive switching. The resistance ratio of ON and OFF state is over 10(2), on top of that, the retention properties of both states are very stable after 10(4) s with a voltage of -0.2 V. (C) 2010 Elsevier Ltd. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Cr(2)O(3) thin film | en_US |
dc.subject | Resistance switching | en_US |
dc.subject | Nonvolatile memory | en_US |
dc.title | Bipolar resistive switching of chromium oxide for resistive random access memory | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.sse.2010.12.014 | en_US |
dc.identifier.journal | SOLID-STATE ELECTRONICS | en_US |
dc.citation.volume | 62 | en_US |
dc.citation.issue | 1 | en_US |
dc.citation.spage | 40 | en_US |
dc.citation.epage | 43 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000292444000007 | - |
dc.citation.woscount | 17 | - |
顯示於類別: | 期刊論文 |